Advanced Cu/Low-k BEOL integration, reliability, and extendibility

被引：1
|
作者：
Edelstein, Daniel C.
机构：
来源：
PROCEEDINGS OF THE IEEE 2007 INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE | 2007年
关键词：
D O I：
10.1109/IITC.2007.382347
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：57 / 57
页数：1
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