Adhesion and mechanical properties of Ti films deposited by DC magnetron sputtering

被引:13
|
作者
Vega-Moron, R. C. [1 ]
Rodriguez Castro, G. A. [1 ]
Melo-Maximo, D. V. [2 ]
Mendez-Mendez, J. V. [3 ]
Melo-Maximo, L. [2 ]
Oseguera-Pena, J. E. [2 ]
Meneses-Amador, A. [1 ]
机构
[1] Inst Politecn Nacl, UP Adolfo Lopez Mateos, SEPI ESIME Zacatenco, Grp Ingn Superficies, Ciudad De Mexico 07738, Mexico
[2] Escuela Ingn & Ciencias Tecnol Monterrey CEM, Carretera Lago de Guadalupe Km 3-5, Mexico City 52926, DF, Mexico
[3] Inst Politecn Nacl, UP Adolfo Lopez Mamas, Ctr Nanociencias & Micronano Tecnol, Ciudad De Mexico 07738, Mexico
来源
关键词
Titanium films; Sputtering; Hardness; Adhesion; Wear; Mechanical properties; TITANIUM THIN-FILMS; MICROSTRUCTURAL CHARACTERIZATIONS; SUBSTRATE TEMPERATURES; ROUGHNESS PARAMETERS; STAINLESS-STEEL; SURFACE; THICKNESS; FRICTION; WEAR; HARDNESS;
D O I
10.1016/j.surfcoat.2018.05.078
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Titanium films were deposited on AISI 316L stainless steel substrates by D.C. unbalanced magnetron sputtering, the substrate temperature and deposition time were changed. In this study, the structural characterization was conducted by scanning electronic microscopy (SEM), spectroscopic ellipsometry (SE), X-ray diffraction (XRD) and atomic force microscopy (AFM). Furthermore, mechanical properties were obtained by nanoindentation. Adhesion and wear behavior were evaluated through progressive load scratch test (PEST) and pin-on-disk test, respectively. Titanium films thicknesses within a range of 2.5-4.2 gm were obtained, different XRD Ti peaks such as (002), (102) and (103) were identified. Values estimated for hardness were between 7.2 and 8.4 GPa, and for Young's modulus they were 126-162 GPa. Tensile cracks, compressive and gross spallation failure mechanisms were found with scratch tests. Preferred oriented sample only showed cracks, with a critical load of 2.6 N, and exhibited a better wear ratio (similar to 1.5 x 10(-4)), which is about two times better than substrate steel. This study provides evidence of how a preferred oriented Ti (002) film exhibits better hardness, adhesion and wear properties.
引用
收藏
页码:1137 / 1147
页数:11
相关论文
共 50 条
  • [21] Structure and mechanical properties of Ti-C films deposited using combination of pulsed DC and normal DC magnetron co-sputtering
    Raman, K. H. T.
    Kiran, M. S. R. N.
    Ramamurty, U.
    Rao, G. Mohan
    APPLIED SURFACE SCIENCE, 2012, 258 (22) : 8629 - 8635
  • [22] Structural, mechanical and corrosion properties of NbN films deposited using dc and pulsed dc reactive magnetron sputtering
    Arslan, E.
    SURFACE ENGINEERING, 2010, 26 (08) : 615 - 619
  • [24] Properties of ITO films deposited by RF superimposed DC magnetron sputtering
    Kim, Se Il
    Cho, Sang Hyun
    Choi, Sung Ryong
    Yoon, Han Ho
    Song, Pung Keun
    CURRENT APPLIED PHYSICS, 2009, 9 : S262 - S265
  • [25] Photoelectric properties of ITO thin films deposited by DC magnetron sputtering
    柳伟
    程树英
    半导体学报, 2011, 32 (01) : 17 - 20
  • [26] Optical properties of AlNxOy thin films deposited by DC magnetron sputtering
    Borges, J.
    Alves, E.
    Vaz, F.
    Marques, L.
    INTERNATIONAL CONFERENCE ON APPLICATIONS OF OPTICS AND PHOTONICS, 2011, 8001
  • [27] INVESTIGATION OF THE PROPERTIES OF SILVER THIN FILMS DEPOSITED BY DC MAGNETRON SPUTTERING
    Wang, Linwen
    Li, Ling
    Chen, Wei-Dong
    SURFACE REVIEW AND LETTERS, 2017, 24 (04)
  • [28] Effects of sputtering power on mechanical properties of Cr films deposited by magnetron sputtering
    Kim, K.
    Park, M.
    Lee, W.
    Kim, H. W.
    Lee, J. G.
    Lee, C.
    MATERIALS SCIENCE AND TECHNOLOGY, 2008, 24 (07) : 838 - 842
  • [29] Photoelectric properties of ITO thin films deposited by DC magnetron sputtering
    Liu Wei
    Cheng Shuying
    JOURNAL OF SEMICONDUCTORS, 2011, 32 (01)
  • [30] The effect of thickness on the properties of titanium films deposited by dc magnetron sputtering
    Jeyachandran, Y. L.
    Karunagaran, B.
    Narayandass, Sa. K.
    Mangalaraj, D.
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2007, 458 (1-2): : 361 - 365