Formation and vanishment of the intragranular microstructure in Si2N2O/Si3N4 nanocomposites

被引：6
|
作者：
Luo JunTing [1 ]
Liu RiPing [1 ]
Qi Li [1 ]
机构：
[1] Yanshan Univ, Coll Mech Engn, State Key Lab Metastable Mat Sci & Technol, Qinhuangdao 066004, Peoples R China
来源：
SCIENCE CHINA-TECHNOLOGICAL SCIENCES | 2010年 / 53卷 / 01期
关键词：
Si2N2O/Si3N4; nanocomposite; intragranular microstructure; transformation vanishment; SILICON-NITRIDE;
D O I：
10.1007/s11431-009-0324-9
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Si2N2O/Si3N4 nanocomposites were fabricated by liquid phase sintering of amorphous nano- sized silicon nitride powders. The intragranular microstructure was observed and researched. Intragranular microstructure's beta-Si3N4 was formed in Si2N2O matrix at the sintering temperature higher than 1650 degrees C. It was discovered that intragranular microstructure could also disappear by transformation during high temperature annealing. Two possible mechanisms of the disappearance of intragranular microstructure were given. The effect of intragranular microstructure on main mechanical properties was also investigated.
引用
收藏
页码：284 / 286
页数：3
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