Performance of 6 μm thick crystalline silicon solar cells on glass substrate

被引:6
|
作者
Kasai, H [1 ]
Wada, H [1 ]
Matsumura, H [1 ]
机构
[1] Japan Adv Inst Sci & Technol, Tatsunokuchi, Ishikawa 9231292, Japan
关键词
thin film; crystalline silicon; separation layer;
D O I
10.1016/S0927-0248(00)00137-9
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Thin crystalline silicon (c-Si) solar cells with a thickness of 6 mum on glass substrate are fabricated. In this study, the top thin layer of silicon-on-insulator (SOI) wafers is used to realize single c-Si films. It is Found that the achieved efficiency of the cell is about 8% by only preparing surface passivation without the textured structure. This value is much higher than the case of bulk c-Si solar cells if the efficiency is converted with respect to the sample thickness. It is suggested that thinner c-Si solar cells are useful for saving materials by maintaining cell efficiency properly. (C) 2001 Publishsd by Elsevier Science B.V. All rights reserved.
引用
收藏
页码:533 / 539
页数:7
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