Performance of 6 μm thick crystalline silicon solar cells on glass substrate

被引：6

作者：

Kasai, H ^{[1
]}

Wada, H ^{[1
]}

Matsumura, H ^{[1
]}

机构：

[1] Japan Adv Inst Sci & Technol, Tatsunokuchi, Ishikawa 9231292, Japan

来源：

SOLAR ENERGY MATERIALS AND SOLAR CELLS | 2001年 / 65卷 / 1-4期

关键词：

thin film; crystalline silicon; separation layer;

D O I：

10.1016/S0927-0248(00)00137-9

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

Thin crystalline silicon (c-Si) solar cells with a thickness of 6 mum on glass substrate are fabricated. In this study, the top thin layer of silicon-on-insulator (SOI) wafers is used to realize single c-Si films. It is Found that the achieved efficiency of the cell is about 8% by only preparing surface passivation without the textured structure. This value is much higher than the case of bulk c-Si solar cells if the efficiency is converted with respect to the sample thickness. It is suggested that thinner c-Si solar cells are useful for saving materials by maintaining cell efficiency properly. (C) 2001 Publishsd by Elsevier Science B.V. All rights reserved.

引用

页码：533 / 539

页数：7

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