Adaptive sampling for effective multi-layer defect monitoring

被引：1

作者：

Kuo, WW ^{[1
]}

Akella, R ^{[1
]}

Fletcher, D ^{[1
]}

机构：

[1] Univ Calif Berkeley, Berkeley, CA 94720 USA

来源：

1997 IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING CONFERENCE PROCEEDINGS | 1997年

关键词：

D O I：

10.1109/ISSM.1997.664521

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The main purpose of this paper is to provide an effective adaptive sampling strategy for defect monitoring in semiconductor manufacturing. The proposed sampling strategy varies the amount of sampling bared on previous observations to achieve fast excursion detection or minimum yield loss due to excursions. This scheme will require the equal or less amount of inspection capacity than the traditional static sampling approach.

引用

页码：D1 / D4

页数：4

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