Optical loss reduction in HIC chalcogenide glass waveguides via thermal reflow

被引：0

作者：

Hu, Juejun ^{[1
]}

Feng, Ning-Ning ^{[1
]}

Agarwal, Anu ^{[1
]}

Kimerling, Lionel ^{[1
]}

Carlie, Nathan ^{[2
]}

Petit, Laeticia ^{[2
]}

Richardson, Kathleen ^{[2
]}

机构：

[1] MIT, Microphoton Ctr, 77 Massachusetts Ave, Cambridge, MA 02139 USA

[2] Clemson Univ, COMSET, Sch Mat Sci & Engn, Clemson, SC 29634 USA

来源：

2009 CONFERENCE ON LASERS AND ELECTRO-OPTICS AND QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE (CLEO/QELS 2009), VOLS 1-5 | 2009年

关键词：

FABRICATION;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A rapid thermal reflow technique is applied to high-index-contrast, sub-micron waveguides in AS(2)S(3) chalcogenide glass to reduce sidewall roughness and associated optical scattering loss. Up to 50% optical loss reduction after reflow treatment is achieved. (C)2009 Optical Society of America

引用

页码：1505 / +

页数：2

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