The materials basis behind the telecommunications revolution

被引：0
|
作者：
Brinkman, WF [1 ]
机构：
[1] AT&T Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA
来源：
MICROSCOPY OF SEMICONDUCTING MATERIALS 1997 | 1997年 / 157期
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D O I：
暂无
中图分类号：
TH742 [显微镜];
学科分类号：
摘要：
A selected review of some recent materials advances which will drive the telecommunications revolution is presented. Included are lithographic materials, projection electron lithography, understanding transient enhanced diffusion, ultra thin oxides, sol-gel preparation for optical fibers, silicon optical bench technology, fiber Bragg gratings and electro absorption modulator lasers.
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页码：1 / 12
页数：12
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