High-performance poly(3-hexylthiophene) top-gate transistors incorporating TiO2 nanocomposite dielectrics

被引:30
|
作者
Yang, Feng-Yu [1 ]
Hsu, Meei-Yu [1 ]
Hwang, Gue-Wuu [1 ]
Chang, Kuo-Jui [2 ,3 ]
机构
[1] Ind Technol Res Inst, Mat & Chem Labs, Hsinchu 310, Taiwan
[2] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan
[3] Natl Chiao Tung Univ, Inst Elect, Hsinchu 300, Taiwan
关键词
Nanocomposites; TiO2; Top-gate; Organic filed-effect transistor; THIN-FILM TRANSISTORS; FIELD-EFFECT TRANSISTORS; VOLTAGE ORGANIC TRANSISTORS; INSULATORS; CIRCUITS; ELECTRONICS; POLYMERS;
D O I
10.1016/j.orgel.2009.10.002
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper describes the fabrication of top-gate P3HT organic field effect transistors (OFETs) incorporating polymer/TiO2 nanocomposite bilayer dielectrics. The TiO2 nanocomposite comprised PVP, the cross-linking agent PMF, and TiO2 nanoparticles (NPs), which possessed rod-like anatase structures and were solution-processable using polar solvents; thus, the composite dielectric solutions were easy to be prepared for the use in top-gate OFET devices without damaging and dissolution of the underlying P3HT film. SEM and AFM images revealed the high uniformity of the nanocomposite films. To determine the effects of the composite dielectrics with/without TiO2 on the performance of the OFET devices, we inserted a buffer layer of PMMA between the semiconductor layer and the gate dielectric to maintain a constant semiconductor-dielectric interface. The device incorporating the PMMA/TiO2 nanocomposite bilayer gate dielectric operated effectively at supply voltages within 20 V, with a good mobility (mu) of 1.5 x 10(-2) cm(2) V-1 s(-1), which was three times greater than that of the devices featuring the PMMA/PVP/PMF dielectric; the on/off ratio of nanocomposite device (8.6 x 10(6)) was significantly better than that of the PVP/PMF device (1.5 x 105). The PMMA/TiO2 nanocomposite was also performed acceptably at supply voltages of less than 10 V. The performance of the OFET incorporating a single dielectric layer of the TiO2 nanocomposite (mu = 0.001 cm(2) V-1 s(-1); on/off ratio = 5.7 x 10(2)) was inferior to those of the bilayer gate dielectric devices. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:81 / 88
页数:8
相关论文
共 50 条
  • [21] Performance recovery and optimization of poly(3-hexylthiophene) transistors by thermal cycling
    Mattis, Brian A.
    Chang, Paul C.
    Subramanian, Vivek
    SYNTHETIC METALS, 2006, 156 (18-20) : 1241 - 1248
  • [22] Improving poly(3-hexylthiophene)-TiO2 heterojunction solar cells by connecting polypyrrole to the TiO2 nanorods
    Li, Feilong
    Ni, Xiuyuan
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2013, 118 : 109 - 115
  • [23] Nucleation, Growth, and Alignment of Poly(3-hexylthiophene) Nanofibers for High-Performance OFETs
    Persson, Nils E.
    Chu, Ping-Hsun
    McBride, Michael
    Grover, Martha
    Reichmanis, Elsa
    ACCOUNTS OF CHEMICAL RESEARCH, 2017, 50 (04) : 932 - 942
  • [24] High-Performance Field-Effect Transistors Based on Polystyrene-b-Poly(3-hexylthiophene) Diblock Copolymers
    Yui, Xiang
    Xiao, Kai
    Chen, Jihua
    Lavrik, Nickolay V.
    Hong, Kunlun
    Sumpter, Bobby G.
    Geohegan, David B.
    ACS NANO, 2011, 5 (05) : 3559 - 3567
  • [25] Fabrication of poly(3-hexylthiophene) nanowires for high-mobility transistors
    Nawrocki, Robert A.
    Pavlica, Egon
    Celic, Nevena
    Orlov, Dmytro
    Valant, Matjaz
    Mihailovic, Dragan
    Bratina, Gvido
    ORGANIC ELECTRONICS, 2016, 30 : 92 - 98
  • [26] Memory effects in poly(3-hexylthiophene) field-effect transistors with floating gate
    Kaneto, Keiichi
    Mori, Keiko
    Morita, Takeomi
    Takashima, Wataru
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2008, 47 (02) : 1382 - 1384
  • [27] High-performance, sub-2 volts TiO2 thin film transistors enabled by ultrathin ZrO2 gate dielectrics
    Zhang, Jie
    Cui, Peng
    Lin, Guangyang
    Zeng, Yuping
    2021 5TH IEEE ELECTRON DEVICES TECHNOLOGY & MANUFACTURING CONFERENCE (EDTM), 2021,
  • [28] High-Performance Short-Channel Top-Gate Indium-Tin-Oxide Transistors by Optimized Gate Dielectric
    Gu, Chengru
    Hu, Qianlan
    Zhu, Shenwu
    Li, Qijun
    Zeng, Min
    Liu, Honggang
    Kang, Jiyang
    Liu, Shiyuan
    Wu, Yanqing
    IEEE ELECTRON DEVICE LETTERS, 2023, 44 (05) : 837 - 840
  • [29] Toward High-Performance Top-Gate Ultrathin HfS2 Field-Effect Transistors by Interface Engineering
    Xu, Kai
    Huang, Yun
    Chen, Bo
    Xia, Yang
    Lei, Wen
    Wang, Zhenxing
    Wang, Qisheng
    Wang, Feng
    Yin, Lei
    He, Jun
    SMALL, 2016, 12 (23) : 3106 - 3111
  • [30] Interfacial engineering affects the photocatalytic activity of poly(3-hexylthiophene)-modified TiO2
    Huang, Jen-Hsien
    Ibrahem, Mohammed Aziz
    Chu, Chih-Wei
    RSC ADVANCES, 2013, 3 (48) : 26438 - 26442