Emerging Patterning materials: Trends, challenges, and opportunities in Patterning and materials by design

被引：0
|
作者：
Herr, Daniel J. C. [1 ]
机构：
[1] Semicond Res Corp, Nanomfg Sci Res, Res Triangle Pk, NC USA
来源：
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV | 2007年 / 6519卷
关键词：
D O I：
10.1117/12.721750
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页数：13
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