Enabling Cutting-Edge Semiconductor Simulation through Grid Technology

被引:0
|
作者
Asenov, Asen [1 ,2 ,3 ]
Reid, Dave [1 ,2 ,3 ]
Millar, Campbell [1 ,2 ,3 ]
Roy, Scott [1 ,2 ,3 ]
Roy, Gareth [1 ,2 ,3 ]
Sinnott, Richard [1 ,2 ,3 ]
Stewart, Gordon [1 ,2 ,3 ]
Stewart, Graeme [1 ,2 ,3 ]
机构
[1] Univ Glasgow, Device Modelling Grp, Glasgow G12 8QQ, Lanark, Scotland
[2] Univ Glasgow, Natl E Sci Ctr, Glasgow G12 8QQ, Lanark, Scotland
[3] Univ Glasgow, Dept Phys & Astron, Glasgow G12 8QQ, Lanark, Scotland
来源
基金
英国工程与自然科学研究理事会;
关键词
nanoCMOS electronics; virtual organization; security; variability; VARIABILITY; MOSFETS; CMOS;
D O I
10.1007/978-3-642-12535-5_43
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
The progressive CMOS scaling drives the success or the global semiconductor industry. Detailed knowledge of transistor behaviour is necessary to overcome the many fundamental challenges faced by chip and systems designers. Grid technology has enabled the constantly increasing statistical variability introduced by discreteness of charge and matter to be examined in unprecedented detail. Over 200,000 transistors subject to random discrete dopants variability have been simulated, the results of which provide detailed insight into underlying physical processes. This paper outlines recent scientific results of the nanoCMOS project, and describes the way in which the scientific goals have been reflected in the grid-based e-infrastructure.
引用
收藏
页码:369 / +
页数:3
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