Phase mode nanomachining on ultra-thin films with atomic force microscopy

被引：7

作者：

Shi, Jialin ^{[1
,2
]}

Liu, Lianqing ^{[1
]}

Yu, Peng ^{[1
]}

Li, Guangyong ^{[3
]}

机构：

[1] Chinese Acad Sci, Shenyang Inst Automat, State Key Lab Robot, Shenyang 110016, Liaoning, Peoples R China

[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China

[3] Univ Pittsburgh, Dept Elect & Comp Engn, Pittsburgh, PA 15261 USA

来源：

MATERIALS LETTERS | 2017年 / 209卷

基金：

中国国家自然科学基金;

关键词：

Atomic force microscopy; Thin films; Wear and tribology; DAMAGE;

D O I：

10.1016/j.matlet.2017.08.071

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Machining or patterning ultra-thin films with specified structures are critical challenges. In this work, a novel mode of atomic force microscopy nanomachining is proposed. The phase response of the cantilever is used as the input of feedback control to modulate the machining force to achieve the desired machined depth. The proposed phase mode, overcoming the disadvantages of force mode, is not affected by the debris piled-up and has the ability to sense the interface of an ultra-thin film and predict the machining depth without post-imaging. The effectiveness of the phase mode has been proven by experiments. (C) 2017 Elsevier B.V. All rights reserved.

引用

页码：437 / 440

页数：4

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