Chemical surface and thin film analysis in glass coating

被引:0
|
作者
Oechsner, H [1 ]
机构
[1] Univ Kaiserslautern, Inst Oberflachen & Schichtanalyt, D-67663 Kaiserslautern, Germany
来源
GLASTECHNISCHE BERICHTE-GLASS SCIENCE AND TECHNOLOGY | 1997年 / 70卷 / 11期
关键词
D O I
暂无
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
After a short overview of recent analytical techniques for compositional surface analysis and the determination of concentration depth profiles, the principle, the instrumentation and the performance of the routinely used electron spectroscopic and mass spectrometric methods, namely photo- and Auger electron spectroscopy as well as secondary ion and secondary neutral mass spectrometry, are described. The application of these techniques to electrically insulating surfaces and layer structures is particularly emphasized by corresponding practical examples. Secondary neutral mass spectrometry is specifically addressed with regard to the potentialities of the novel high-frequency mode of electron-gas secondary neutral mass spectrometry for quantitative composition analysis and high-resolution depth profiling of electrically nonconducting sample structures.
引用
收藏
页码:340 / 353
页数:14
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