Low dislocation density 3-inch Si doped GaAs crystals by vertical boat growth

被引:0
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作者
Hagi, Y
Kawarabayashi, S
Inoue, T
Nakai, R
Kohno, J
Kawase, T
Tatsumi, M
机构
来源
SEMICONDUCTING AND INSULATING MATERIALS, 1996: PROCEEDINGS OF THE 9TH CONFERENCE ON SEMICONDUCTING AND INSULATING MATERIALS (SIMC'96) | 1996年
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
3-inch Si doped GaAs crystals with low dislocation density (less than or equal to 100cm(-2)) were developed by the Vertical Boat (VB) method. The shape of the solid/liquid interface was controlled by the temperature gradient near the interface. The desirable interface shape for low dislocation density was studied both empirically and through computer simulation. By improving the interface shape, the stable production of crystals with low dislocation density were achieved.
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页码:279 / 282
页数:4
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