Growth of silicon nitride by nitridation of amorphous silicon at low temperature in hot-wire CVD

被引：13
|
作者：
Rai, Dharmendra Kumar [1 ]
Solanki, Chetan Singh [1 ]
Kavaipatti, Balasubramaniam R. [1 ]
机构：
[1] Indian Inst Technol, Dept Energy Sci & Engn, Bombay 400076, Maharashtra, India
来源：
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING | 2017年 / 67卷
关键词：
Amorphous silicon; Silicon nitride; Nitridation; Hot-wire CVD; Ammonia; Low temperature; CHEMICAL-VAPOR-DEPOSITION; RAY PHOTOELECTRON-SPECTROSCOPY; THIN-FILMS; ELECTRONIC-STRUCTURE; HYDROGEN EFFUSION; RAMAN-SPECTRA; LOCAL ORDER; NITROGEN; PLASMA; SI;
D O I：
10.1016/j.mssp.2017.05.015
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Silicon nitride.(SiNx) layers of varying thickness were fabricated in a a-Si/SiNx/a-Si heterostructure via nitridation of the bottom a-Si layer, using ammonia (NH3) gas, in the hot-wire chemical vapor deposition (HWCVD) chaniber at 250 degrees C. The thickness of the SiNx in the film was varied by changing the nitridation time (t(N)) in range of 1-30 min. Raman analysis showed that the a-Si and SiNx layers formed in the films were amorphous. Fourier transform infrared (FTIR) and X-ray photoelectron spectroscopy (XPS) results indicated Si3N4 was formed in the nitrided a-Si. Presence of strong SiH2 (2086 cm(-1)) peaks in the FTIR spectrum suggested the hydrogen in a-Si effused at 250 degrees C. XPS Si2p spectra and high resolution transmission electron microscopy images showed thin SiNx layer of thickness 1.8-7.6 nm was formed. Formation of SiNx thicker than 7.6 run even at a low temperature (250 degrees C) is suggestive of the H effusion promoting both the reaction and the diffusion of the nitridants in a-Si. The kinetics of the growth of SiNx during nitridation of the a-Si layer closely matches the growth process described by diffusion model, wherein the reaction of nitridants and a-Si is controlled by diffusion in the SiNx layer formed.
引用
收藏
页码：46 / 54
页数：9
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