Anodic Oxide Films on Niobium and Tantalum in Different Aqueous Electrolytes and Their Impedance Characteristics

被引:6
|
作者
Verma, N. [1 ]
Singh, K. C. [1 ]
Mari, B. [2 ]
Mollar, M. [2 ]
Jindal, J. [1 ]
机构
[1] Maharshi Dayanand Univ, Dept Chem, Rohtak 124001, Haryana, India
[2] Univ Politecn Valencia, Dept Fis Aplicada, Inst Disseny Fabricac Automatitzada, Cami de Vera S-N, E-46022 Valencia, Spain
关键词
SOL-GEL PROCESS; SELF-ORGANIZED NIOBIUM; ELECTRICAL-PROPERTIES; THIN-FILMS; DIELECTRIC-PROPERTIES; ACID SOLUTION; NB2O5; SPECTROSCOPY; CRYSTALLIZATION; ANODIZATION;
D O I
10.12693/APhysPolA.129.297
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The anodic oxide films were prepared on the niobium and tantalum in aqueous electrolyte mixtures containing 1 M CH3COOH + 1 M H3PO4 or 1 M CH3COOH + 1 vol.% HF or 1 M CH3COOH + 1 M H3PO4 + 1 vol.% HF at 30 V for 30 min. The barrier films were obtained on both niobium and tantalum surfaces in all electrolyte mixtures except niobium oxide film formed in 1 M CH3COOH + 1 vol.% HF which is porous in nature. The anodic oxide films were characterized by FESEM. Also, electrochemical impedance spectroscopy at open-circuit potential on Nb and Ta was applied and obtained data were analyzed by fitting with four different equivalent circuits.
引用
收藏
页码:297 / 303
页数:7
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