Anodic Oxide Films on Niobium and Tantalum in Different Aqueous Electrolytes and Their Impedance Characteristics

The anodic oxide films were prepared on the niobium and tantalum in aqueous electrolyte mixtures containing 1 M CH3COOH + 1 M H3PO4 or 1 M CH3COOH + 1 vol.% HF or 1 M CH3COOH + 1 M H3PO4 + 1 vol.% HF at 30 V for 30 min. The barrier films were obtained on both niobium and tantalum surfaces in all electrolyte mixtures except niobium oxide film formed in 1 M CH3COOH + 1 vol.% HF which is porous in nature. The anodic oxide films were characterized by FESEM. Also, electrochemical impedance spectroscopy at open-circuit potential on Nb and Ta was applied and obtained data were analyzed by fitting with four different equivalent circuits.