Fabrication of submicron gratings in fused silica by F2-laser ablation

被引：62

作者：

Ihlemann, J

Müller, S

Pischmann, S

Schäfer, D

Wei, M

Li, J

Herman, PR

机构：

[1] Laser Lab Gottingen, D-37077 Gottingen, Germany

[2] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 3G4, Canada

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2003年 / 76卷 / 05期

关键词：

D O I：

10.1007/s00339-002-1467-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Submicron surface-relief gratings were fabricated on fused silica by F-2-laser ablation with nanosecond duration pulses from a high-resolution 157-nm optical processing system. A 157 nm wavelength projection mask was prepared by ArF-laser ablation to form a 20-mum period grating of equal lines and spaces. A 25-fold demagnification of the mask by a Schwarzschild objective generated gratings of an 830-nm period and a 250 nm modulation depth, as characterized by SEM, AFM and HeNe-laser beam diffraction.

引用

页码：751 / 753

页数：3

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