Lithium-ion drifting: Application to the study of point defects in floating-zone silicon

被引:0
|
作者
Walton, JT [1 ]
Haller, EE [1 ]
Knowlton, WB [1 ]
Wong, YK [1 ]
von Ammon, W [1 ]
Zulehner, W [1 ]
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
关键词
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The use of lithium-ion (Li+) drifting to study the properties of point defects in p-type Floating-Zone (FZ) silicon crystals is reported. The Li+ drift technique is used to detect the presence of vacancy-related defects (D defects) in certain p-type FZ silicon crystals. SUPREM-IV modeling suggests that the silicon point defect diffusivities are considerably higher than those commonly accepted, but are in reasonable agreement with values recently proposed. These results demonstrate the utility of Li+ drifting in the study of silicon point defect properties in p-type FZ crystals. Finally, a straightforward measurement of the Li+ compensation depth is shown to yield estimates of the vacancy-related defect concentration in p-type FZ crystals.
引用
收藏
页码:400 / 411
页数:12
相关论文
共 50 条
  • [1] LITHIUM-ION MOBILITY IMPROVEMENT IN FLOATING-ZONE SILICON BY EXTERNAL GETTERING
    WALTON, JT
    DERHACOBIAN, N
    WONG, YK
    HALLER, EE
    APPLIED PHYSICS LETTERS, 1993, 63 (03) : 343 - 345
  • [2] Properties of silicon point defects as revealed by lithium ion drifting
    Knowlton, WB
    Walton, JT
    Lee, JS
    Lewak, D
    Wong, YK
    Haller, EE
    PROCEEDINGS OF THE FOURTH INTERNATIONAL SYMPOSIUM ON PROCESS PHYSICS AND MODELING IN SEMICONDUCTOR TECHNOLOGY, 1996, 96 (04): : 324 - 336
  • [3] LITHIUM DRIFTED SILICON DETECTOR FABRICATION ON GETTERED FLOATING-ZONE SILICON
    WALTON, JT
    WONG, YK
    DERHACOBIAN, N
    HALLER, EE
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1994, 41 (04) : 1031 - 1036
  • [4] CHARACTERIZATION OF SWIRL DEFECTS IN FLOATING-ZONE SILICON-CRYSTALS
    PETROFF, PM
    DEKOCK, AJR
    JOURNAL OF CRYSTAL GROWTH, 1975, 30 (01) : 117 - 124
  • [5] A simple method of examining the propagation of defects in the floating-zone solidification process of lithium niobate
    Chen, JC
    Lee, YC
    Hu, C
    JOURNAL OF CRYSTAL GROWTH, 1996, 166 (1-4) : 151 - 155
  • [6] Oxygen precipitation in floating-zone silicon grown in hydrogen ambience and its application
    Li, HX
    Li, CB
    He, YJ
    Liu, GR
    Chen, YS
    Duan, SZ
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2001, 83 (1-3): : 106 - 110
  • [7] Numerical simulation of point defect transport in floating-zone silicon single crystal growth
    Larsen, TL
    Jensen, L
    Lüdge, A
    Riemann, H
    Lemke, H
    JOURNAL OF CRYSTAL GROWTH, 2001, 230 (1-2) : 300 - 304
  • [8] FORMATION OF INTERSTITIAL SWIRL DEFECTS IN DISLOCATION-FREE FLOATING-ZONE SILICON-CRYSTALS
    PETROFF, PM
    DEKOCK, AJR
    JOURNAL OF CRYSTAL GROWTH, 1976, 36 (01) : 4 - 10
  • [9] Infrared study on the oxygen precipitation in floating-zone silicon grown in hydrogen ambience
    Li, HX
    Li, CB
    Xue, CS
    Diao, ZY
    Chen, LS
    Zhu, L
    RARE METAL MATERIALS AND ENGINEERING, 2001, 30 : 568 - 571
  • [10] MICRODEFECTS IN FLOATING-ZONE SILICON - INFLUENCE OF GROWTH-PARAMETERS
    TRUBITSYN, YV
    CHERVONYI, IF
    NEIMARK, KN
    INORGANIC MATERIALS, 1994, 30 (04) : 530 - 531