IR SPECTRAL CHARACTERISTICS OF LITHIUM HYDRIDE THIN FILMS

被引：6
|
作者：
Lei, J. -H. [1 ]
Xing, P. -F. [1 ]
Tang, Y. -J. [1 ]
Wu, W. -D. [1 ]
Wang, F. [1 ]
机构：
[1] China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Peoples R China
来源：
JOURNAL OF APPLIED SPECTROSCOPY | 2010年 / 77卷 / 01期
关键词：
lithium hydride thin films; IR spectra; pressure of H(2); BORON-NITRIDE FILMS; SPECTROSCOPY; LIH; HYDROGEN;
D O I：
10.1007/s10812-010-9305-9
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
Lithium hydride thin films were deposited by pulsed laser deposition and structurally characterized by means of IR spectra. The pressure of H(2) used as a reactive gas was changed and the substrate temperature, substrate-target distance, laser fluence, and other conditions were defined. The research result shows that the pressure of H(2) is an important factor that affects the quality of lithium hydride films. With increase in hydrogen gas pressure, the H(2) content in the films rises and peak maxima of the Li-H bond move to higher wave numbers.
引用
收藏
页码：140 / 143
页数：4
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