Porous Anodic Alumina Template Formation: Deposition Technique Dependence

被引：2

作者：

Upreti, S. ^{[1
]}

Mukherjee, K. ^{[1
,2
]}

Palit, M.

Bag, A. ^{[1
]}

Mallik, S. ^{[1
]}

Chattopadhyay, S. ^{[2
,3
]}

Maiti, C. K. ^{[1
]}

机构：

[1] Indian Inst Technol, Dept Elect & ECE, VLSI Engn Lab, Kharagpur 721302, W Bengal, India

[2] Univ Calcutta, Ctr Res Nanosci & Nanotechnol, Kolkata 700098, W Bengal, India

[3] Univ Calcutta, Dept Elect Sci, Kolkata 700009, W Bengal, India

来源：

PHYSICS OF SEMICONDUCTOR DEVICES | 2014年

关键词：

AAO; PAA; RF magnetron sputter; Vacuum evaporation; FABRICATION; ARRAYS; ELECTRODEPOSITION; NANOMATERIALS; FILM;

D O I：

10.1007/978-3-319-03002-9_187

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Porous anodic alumina (PAA) oxide layers have been deposited on TiN/SiO2/Si by both the vacuum evaporation (VE) and RF magnetron sputtering (MS) techniques. The deposition technique dependence of the pore size at the surfaces of the anodic aluminum oxide (AAO) membranes has been investigated after two step anodization process. The nanochannel arrays of AAO membranes were characterized with scanning electron microscopy (SEM), atomic force microscopy (AFM) and Fourier transform infrared attenuated total reflectance (FTIR-ATR) analysis. Chemical composition and film structural properties were investigated by x-ray photoelectron spectroscopy (XPS) and high resolution x-ray diffraction (HR-XRD) analyses. It is shown that uniform pore density in AAO templates is obtained using Al films deposited using RF sputtering technique.

引用

页码：725 / 728

页数：4

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