Properties of metastable hydrogen-related defects in n-type GaAs studied by isothermal deep-level transient spectroscopy

被引:10
|
作者
Tokuda, Y [1 ]
Kamiya, K
Okumura, T
机构
[1] Aichi Inst Technol, Dept Elect, Toyota 4700392, Japan
[2] Tokyo Metropolitan Univ, Dept Elect Engn, Tokyo 1920397, Japan
关键词
D O I
10.1063/1.1305929
中图分类号
O59 [应用物理学];
学科分类号
摘要
Metastable hydrogen-related defects (M3/M4) in n-GaAs were studied in detail by using isothermal deep-level transient spectroscopy. In order to clarify the electric-field dependence of the electron-emission process, the double-correlation technique was applied to both M3 and M4 defects. It was clearly shown that with increasing electric field, the M4 level observed around 140 K split into two discrete components labeled M4(1) and M4(2). The result supports the recent finding that the M4 defect consists of two different configurations. On the other hand, the M3 defect gave a single peak in the double-correlation spectra around 230 K. The electric field dependence of the emission rates suggests that the M3 and M4(1) defects have a donor-like nature, while the M4(2) defect is acceptor-like. It was speculated that the metastable defect coupling with the M3 level is only M4(2) out of two components of the M4 defect. (C) 2000 American Institute of Physics. [S0021- 8979(00)06416-1].
引用
收藏
页码:1943 / 1947
页数:5
相关论文
共 50 条
  • [31] Compensating levels in p-type ZnSe:N studied by optical deep-level transient spectroscopy
    Wang, SQ
    Lu, F
    Zhu, ZQ
    Sekiguchi, T
    Okushi, H
    Kimura, K
    Yao, T
    PHYSICAL REVIEW B, 1998, 58 (16) : 10502 - 10509
  • [32] Electron irradiation of ion-implanted n-type Si-SiO2 structures studied by deep-level transient spectroscopy
    S. Kaschieva
    K.G. Stefanov
    D. Karpuzov
    Applied Physics A, 1998, 66 : 561 - 563
  • [33] Electron irradiation of ion-implanted n-type Si-SiO2 structures studied by deep-level transient spectroscopy
    Kaschieva, S
    Stefanov, KG
    Karpuzov, D
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1998, 66 (05): : 561 - 563
  • [34] A study of the dependence of electron-induced defects on the doping impurity density in n-type germanium by deep-level transient spectroscopy (DLTS)
    Nyamhere, Cloud
    Auret, F. D.
    Das, A. G. M.
    Chawanda, A.
    PHYSICA B-CONDENSED MATTER, 2007, 401 : 499 - 502
  • [35] A deep-level transient spectroscopy study of Co- and Ni-germanided n-type germanium
    Opsomer, K.
    Simoen, E.
    Claeys, C.
    Maex, K.
    Detavernier, C.
    Van Meirhaeghe, R. L.
    Forment, S.
    Clauws, P.
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2006, 9 (4-5) : 554 - 558
  • [36] Bond-centered hydrogen in silicon studied by in situ deep-level transient spectroscopy
    Nielsen, KB
    Nielsen, BB
    Hansen, J
    Andersen, E
    Andersen, JU
    PHYSICAL REVIEW B, 1999, 60 (03): : 1716 - 1728
  • [37] COMPARISON OF NEUTRON AND 2 MEV ELECTRON DAMAGE IN N-TYPE SILICON BY DEEP-LEVEL TRANSIENT SPECTROSCOPY
    TOKUDA, Y
    USAMI, A
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1981, 28 (03) : 3564 - 3568
  • [38] DEEP-LEVEL TRANSIENT SPECTROSCOPY OF HIGH-ENERGY HEAVY-ION IRRADIATION-INDUCED DEFECTS IN N-TYPE GERMANIUM
    MARIE, P
    LEVALOIS, M
    BOGDANSKI, P
    JOURNAL OF APPLIED PHYSICS, 1993, 74 (02) : 868 - 871
  • [39] DEEP-LEVEL ANALYSIS OF N-TYPE GAAS1-XPX ALLOYS
    BENSALEM, MM
    ZAIDI, MA
    MAAREF, H
    BOURGOIN, JC
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (02) : 1004 - 1007
  • [40] Study of metal-related deep-level defects in germanide Schottky barriers on n-type germanium
    Simoen, E.
    Opsomer, K.
    Claeys, C.
    Maex, K.
    Detavernier, C.
    Van Meirhaeghe, R. L.
    Clauws, P.
    JOURNAL OF APPLIED PHYSICS, 2008, 104 (02)