Hydrogen radical processing - In-situ semiconductor surface cleaning for epitaxial regrowth

被引：0
|
作者：
Kunzel, H [1 ]
Hase, A [1 ]
Griebenow, U [1 ]
机构：
[1] HEINRICH HERTZ INST NACHRICHTENTECH BERLIN GMBH,D-10587 BERLIN,GERMANY
来源：
1996 EIGHTH INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS | 1996年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：408 / 411
页数：4
相关论文
共 50 条
  • [21] MBE REGROWTH WITH HYDROGEN CLEANING AND ITS APPLICATION FOR THE FABRICATION OF SURFACE TUNNEL TRANSISTORS
    BABA, T
    UEMURA, T
    MIZUTA, M
    JOURNAL OF CRYSTAL GROWTH, 1993, 127 (1-4) : 887 - 891
  • [22] Improved Regrowth Interface of AlGaInAs/InP-Buried-Heterostructure Lasers by In-Situ Thermal Cleaning
    Takino, Yuta
    Shirao, Mizuki
    Sato, Noriaki
    Sato, Takashi
    Amemiya, Tomohiro
    Nishiyama, Nobuhiko
    Arai, Shigehisa
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 2012, 48 (08) : 971 - 979
  • [23] IN-SITU NATIVE-OXIDE REMOVAL FROM ALGAINAS SURFACES BY HYDROGEN RADICAL TREATMENT FOR MOLECULAR-BEAM EPITAXY REGROWTH
    HASE, A
    GIBIS, R
    KUNZEL, H
    GRIEBENOW, U
    APPLIED PHYSICS LETTERS, 1994, 65 (11) : 1406 - 1408
  • [24] Determination of Metal Contaminants Using Automated In-Situ Metrology in Semiconductor Cleaning Process
    Lee, J. S.
    Jun, Pil Kwon
    Lim, H. B.
    IEEE SENSORS JOURNAL, 2011, 11 (05) : 1120 - 1128
  • [25] IN-SITU DC-HYDROGEN PLASMA CLEANING OF SI(111) SURFACES
    KAFADER, U
    SIRRINGHAUS, H
    RAMM, J
    DOMMANN, A
    VONKANEL, H
    HELVETICA PHYSICA ACTA, 1994, 67 (02): : 211 - 212
  • [26] In-situ low temperature cleaning of silicon surfaces using hydrogen atoms
    AEA Technology, Oxon, United Kingdom
    Vacuum, 7 (667-672):
  • [27] IN-SITU LASER REFLECTOMETRY OF THE EPITAXIAL-GROWTH OF THIN SEMICONDUCTOR-FILMS
    FARRELL, T
    ARMSTRONG, JV
    APPLIED SURFACE SCIENCE, 1995, 86 (1-4) : 582 - 590
  • [28] IN-SITU OBSERVATIONS OF MISFIT DISLOCATIONS IN LATTICE-MISMATCHED EPITAXIAL SEMICONDUCTOR HETEROSTRUCTURES
    HULL, R
    BEAN, J
    MRS BULLETIN, 1994, 19 (06) : 32 - 37
  • [29] Anisotropic reflectance from semiconductor surfaces for in-situ monitoring in epitaxial growth systems
    Zorn, M
    Jonsson, J
    Richter, W
    Zettler, JT
    Ploska, K
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1995, 152 (01): : 23 - 34
  • [30] All-Semiconductor Photonic Crystal Surface-Emitting Lasers Based on Epitaxial Regrowth
    Taylor, Richard J. E.
    Williams, David M.
    Childs, D. T. D.
    Stevens, Ben J.
    Shepherd, Luke R.
    Khamas, Salam
    Groom, Kristian M.
    Hogg, Richard A.
    Ikeda, Naoki
    Sugimoto, Yoshimasa
    IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2013, 19 (04)
12345