Hydrogen radical processing - In-situ semiconductor surface cleaning for epitaxial regrowth

被引：0
|
作者：
Kunzel, H [1 ]
Hase, A [1 ]
Griebenow, U [1 ]
机构：
[1] HEINRICH HERTZ INST NACHRICHTENTECH BERLIN GMBH,D-10587 BERLIN,GERMANY
来源：
1996 EIGHTH INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE AND RELATED MATERIALS | 1996年
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：408 / 411
页数：4
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