Measurement of local optomechanical properties of MoSe2 monolayers

被引:0
|
作者
Benimetskiy, F. A. [1 ]
Sharov, V. A. [2 ,3 ]
Alekseev, P. A. [2 ]
Kravtsov, V [1 ]
Park, K-D [4 ]
Samusev, A. K. [1 ]
Iorsh, I., V [1 ]
机构
[1] ITMO Univ, Dept Phys & Engn, St Petersburg 197101, Russia
[2] RAS, Ioffe Phys Tech Inst, St Petersburg 194021, Russia
[3] Acad Univ, St Petersburg 194021, Russia
[4] Ulsan Natl Inst Sci & Technol UNIST, Dept Phys, Ulsan, South Korea
基金
新加坡国家研究基金会; 俄罗斯基础研究基金会;
关键词
QUANTUM EMITTERS;
D O I
10.1063/5.0032285
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Strain engineering is a powerful tool for tuning physical properties of 2D materials, including thin layers of transition metal dichalcogenides (TMDs). Here we study experimentally the achievable local excitonic spectral shifts through a combination of a controllable deformation experiment with in-situ optical characterization, rigorous numerical simulations, and careful account for the optical resolution of the setup. We extract the spatial profiles of strain-induced exciton energy shift depending on the depth of the local indentation of a 2D semiconductor performed by an AFM tip and unambiguously detect the flake rupture. This allows us to systematically investigate the optomechanical properties of TMD monolayers at each indentation depth. Our approach is a powerful tool for in-situ characterization of local optomechanical properties of two-dimensional semiconductors with a strong excitonic response.
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页数:3
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