Surface characterization of thin film devices and optical elements

被引：0

作者：

Sahoo, NK ^{[1
]}

Bhattacharyya, D ^{[1
]}

Thakur, S ^{[1
]}

Udupa, D ^{[1
]}

Shukla, RP ^{[1
]}

Das, NC ^{[1
]}

Roy, AP ^{[1
]}

机构：

[1] Bhabha Atom Res Ctr, Div Spect, Mumbai 400085, India

来源：

CURRENT SCIENCE | 2000年 / 78卷 / 12期

关键词：

D O I：

暂无

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

Optical techniques provide a convenient and nondestructive approach for characterization of surface of thin films and optical elements. This article describes various advanced techniques like spectrophotometry, laser calorimetry, spectroscopic phase-modulated ellipsometry and Zygo interferometry which have been applied to various thin films and optical elements to characterize not only surface features but to also probe inhomogeneity, contamination and inclusions in surface sub-layers.

引用

页码：1528 / 1531

页数：4

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