A comparison between the atomic force microscopy and x-ray reflectivity on the characterization of surface roughness

被引：7

作者：

Lee, Chih-Hao ^{[1
]}

Pen, Wen-Yen ^{[1
]}

Lin, Ming-Zhe ^{[1
]}

Yu, Kuan-Li ^{[1
]}

Hsueh, Jen-Chung ^{[1
]}

机构：

[1] Natl Tsing Hua Univ, Dept Engn & Syst Sci, Hsinchu 30043, Taiwan

来源：

International Journal of Nanoscience, Vol 2, Nos 4 and 5 | 2003年 / 2卷 / 4-5期

关键词：

x-ray reflectivity; surface roughness; atomic force microscopy;

D O I：

10.1142/S0219581X03001371

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Atomic force microscopy and X-ray reflectivity methods are used to characterize a surface morphology which includes the information of rms roughness, roughness exponent, and the height-height correlation length. Two major reasons to interpret the discrepancy of rms roughness data measured by AFM and X-ray reflectivity are (1) the bandpass of power spectra density is different and (2) the X-ray reflectivity probes the high density buried layer.

引用

页码：343 / 348

页数：6

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