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Sb-treatment effect of GaAs substrate on Sb-doped Cd1-xMnxTe growth by MOVPE
被引:1
|作者:
Goto, Hideo
[1
]
Tahashi, Masahiro
[1
]
Ido, Toshiyuki
[1
]
机构:
[1] Chubu Univ, Dept Elect Engn, Aichi 4878501, Japan
来源:
PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS
|
2007年
/
244卷
/
05期
关键词:
D O I:
10.1002/pssb.200675134
中图分类号:
O469 [凝聚态物理学];
学科分类号:
070205 ;
摘要:
Sb-doped Cd1-xMnxTe was successfully grown on (100)GaAs substrate by metal-organic vapor phase epitaxy under atmospheric pressure by Sb-treatment of the GaAs substrate prior to the growth. The Sb-treatment of GaAs substrate creates a GaSb layer on the GaAs substrate, which relaxes the lattice misfit between the GaAs substrate and the Sb-doped Cd1-xMnxTe. The best FWHM of (400) diffraction of Sb-doped Cd1-xMnxTe was 580 seconds, where the TESb supply rate of the Sb-treatment was 2.2 mu mol/min. (C) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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页码:1691 / 1693
页数:3
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