Sb-treatment effect of GaAs substrate on Sb-doped Cd1-xMnxTe growth by MOVPE

被引:1
|
作者
Goto, Hideo [1 ]
Tahashi, Masahiro [1 ]
Ido, Toshiyuki [1 ]
机构
[1] Chubu Univ, Dept Elect Engn, Aichi 4878501, Japan
来源
关键词
D O I
10.1002/pssb.200675134
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Sb-doped Cd1-xMnxTe was successfully grown on (100)GaAs substrate by metal-organic vapor phase epitaxy under atmospheric pressure by Sb-treatment of the GaAs substrate prior to the growth. The Sb-treatment of GaAs substrate creates a GaSb layer on the GaAs substrate, which relaxes the lattice misfit between the GaAs substrate and the Sb-doped Cd1-xMnxTe. The best FWHM of (400) diffraction of Sb-doped Cd1-xMnxTe was 580 seconds, where the TESb supply rate of the Sb-treatment was 2.2 mu mol/min. (C) 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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页码:1691 / 1693
页数:3
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