Schottky barrier height at metal/ZnO interface: A first-principles study

被引:16
|
作者
Chen, Jiaqi [1 ]
Zhang, Zhaofu [1 ]
Guo, Yuzheng [2 ]
Robertson, John [1 ]
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
[2] Swansea Univ, Coll Engn, Swansea SA1 8EN, W Glam, Wales
基金
英国工程与自然科学研究理事会;
关键词
Schottky barrier heights; Metal/ZnO interface; Si/ZnO interface; Band alignment; First-principles calculation; CONTACTS;
D O I
10.1016/j.mee.2019.111056
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The Schottky barrier heights (SBHs) of various metals on ZnO are investigated by first-principles calculation. The SBHs decrease linearly with increasing metal work function, which follows the prediction of the metal-induced gap states (MIGS) model. The pinning factor S is calculated to be 0.56 which indicates moderate pinning effect. A closer look at the interfacial electronic structure shows the dominant rule of oxygen in forming the MIGS. To extend the concept of MIGS model to the band alignment between semiconductors, a calculation is performed on Si/ZnO interface. Si is found to have a type-H band alignment with ZnO, the conduction band offset (CBO) and valence band offset (VBO) are calculated to be 0.5 eV and 2.5 eV respectively. The results agree with the experimental values and the predicted values based on the charge neutrality level (CNL) method.
引用
收藏
页数:4
相关论文
共 50 条
  • [21] Chemical Trend of Schottky-Barrier Change by Segregation Layers at Metal/Si Interfaces: First-Principles Study
    Nakayama, T.
    Maruta, Y.
    Kobinata, Y.
    SIGE, GE, AND RELATED COMPOUNDS 4: MATERIALS, PROCESSING, AND DEVICES, 2010, 33 (06): : 913 - 919
  • [22] Physics of Schottky-barrier change by segregation and structural disorder at metal/Si interfaces: First-principles study
    Nakayama, T.
    Kobinata, K.
    THIN SOLID FILMS, 2012, 520 (08) : 3374 - 3378
  • [23] First-principles Calculations on the Schottky Barrier Height of the NiGe/n-type Ge Contact with Dopant Segregation
    Lin, Han-Chi
    Lin, Chiung-Yuan
    Shih, Che-Ju
    Tsui, Bing-Yue
    2014 INTERNATIONAL SYMPOSIUM ON NEXT-GENERATION ELECTRONICS (ISNE), 2014,
  • [24] Barrier height of metal/InP Schottky contacts with interface oxide layer
    Yamagishi, Haruo
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1988, 27 pt 1 (06): : 997 - 1001
  • [25] Schottky barriers at hexagonal boron nitride/metal interfaces: A first-principles study
    Bokdam, Menno
    Brocks, Geert
    Katsnelson, M. I.
    Kelly, Paul J.
    PHYSICAL REVIEW B, 2014, 90 (08)
  • [26] BARRIER HEIGHT OF METAL/INP SCHOTTKY CONTACTS WITH INTERFACE OXIDE LAYER
    YAMAGISHI, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1988, 27 (06): : 997 - 1001
  • [27] Magnetism in transition-metal-doped ZnO: A first-principles study
    Gu, Gangxu
    Xiang, Gang
    Luo, Jia
    Ren, Hongtao
    Lan, Mu
    He, Duanwei
    Zhang, Xi
    JOURNAL OF APPLIED PHYSICS, 2012, 112 (02)
  • [28] The effects of point defect type, location, and density on the Schottky barrier height of Au/MoS2 heterojunction: a first-principles study
    Sorkin, Viacheslav
    Zhou, Hangbo
    Yu, Zhi Gen
    Ang, Kah-Wee
    Zhang, Yong-Wei
    SCIENTIFIC REPORTS, 2022, 12 (01)
  • [29] The effects of point defect type, location, and density on the Schottky barrier height of Au/MoS2 heterojunction: a first-principles study
    Viacheslav Sorkin
    Hangbo Zhou
    Zhi Gen Yu
    Kah-Wee Ang
    Yong-Wei Zhang
    Scientific Reports, 12
  • [30] First principle study of Bias Voltage dependent Schottky barrier height of Pt/MgO interface
    Ramesh, M.
    Niranjan, Manish K.
    3RD INTERNATIONAL CONFERENCE ON CONDENSED MATTER & APPLIED PHYSICS (ICC-2019), 2020, 2220