Novel x-ray mask inspection tool based on transmission x-ray conversion microscope

被引：0
|
作者：
Liang, ST [1 ]
Cerrina, F [1 ]
Lucatorto, T [1 ]
机构：
[1] UNIV WISCONSIN,CTR XRAY LITHOG,MADISON,WI 53706
来源：
ELECTRON-BEAM, X-RAY, EUV, AND ION-BEAM SUBMICROMETER LITHOGRAPHIES FOR MANUFACTURING VI | 1996年 / 2723卷
关键词：
X-ray mask inspection; transmission x-ray conversion microscope; optical alignment;
D O I：
暂无
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：211 / 220
页数：10
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