Novel x-ray mask inspection tool based on transmission x-ray conversion microscope

被引：0

作者：

Liang, ST ^{[1
]}

Cerrina, F ^{[1
]}

Lucatorto, T ^{[1
]}

机构：

[1] UNIV WISCONSIN,CTR XRAY LITHOG,MADISON,WI 53706

来源：

ELECTRON-BEAM, X-RAY, EUV, AND ION-BEAM SUBMICROMETER LITHOGRAPHIES FOR MANUFACTURING VI | 1996年 / 2723卷

关键词：

X-ray mask inspection; transmission x-ray conversion microscope; optical alignment;

D O I：

暂无

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：211 / 220

页数：10

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