UV-curable positive photoresists for screen printing plate

One of the most interesting application areas of screen printing is the production of microelectronic devices. Although negative photoresists are commonly used for the screen printing plate, their resolution limit is about 30 mu m. A higher resolution of resist patterns on the screen plate is essential for microelectronic device applications. This paper describes the novel design of a UV-curable positive photoresist and its application to the screen printing plate. Positive patterns on the screen plate were obtained by conventional photolithography using a photomask and 365nm light and the patterns were exposed to 254nm light to enhance the mechanical strength of the resist patterns. It was essential to use photoacid generators sensitive to 365nm and photoradical generators sensitive to 254nm. A screen printing plate, which enabled the formation of 6 mu m wide conductive lines, was developed. (c) 2016 Society of Chemical Industry