A Derivation of Ion Energy Distribution Function for Dual Frequencies Capacitively Coupled Plasma

被引:0
|
作者
Zhou, Zhuwen [1 ]
Chen, Deliang [1 ]
Kong, Bo [1 ]
Wang, Yuansheng [1 ]
机构
[1] Guizhou Normal Coll, Inst Plasma Applicat Technol, Guiyang 550018, Peoples R China
关键词
Dual frequencies; Ion energy distributions(IEDs); Carry wave; Modulated wave; Multi-peaks; Theory model; SHEATHS;
D O I
10.4028/www.scientific.net/AMM.513-517.4253
中图分类号
TU [建筑科学];
学科分类号
0813 ;
摘要
A model of ion energy distribution of dual frequencies capacitively coupled plasma (CCP) has been investigated, it is important to analyze these phenomenon and mechanism in order to control the microelectronic processes of integrated circuit and develop the base theories of plasma physics. We focused on the function of the ion energy distributions under high and low frequencies (dual frequencies) drive in capacitive discharges, we derived a theory model of the dual frequencies driven IEDs from analyzing theories. The model can analyze and predict the IEDs under different high and low frequencies driven, which results in accurate multi-peaks IEDs and energy width for the given control parameters, particle-in-cell (PIC) simulations are used to verify this model.
引用
收藏
页码:4253 / 4256
页数:4
相关论文
共 50 条
  • [21] ELECTRON-ENERGY DISTRIBUTION FUNCTION MEASUREMENTS IN CAPACITIVELY COUPLED RF DISCHARGES
    DILECCE, G
    CAPITELLI, M
    DEBENEDICTIS, S
    JOURNAL OF APPLIED PHYSICS, 1991, 69 (01) : 121 - 128
  • [22] Angular distribution measurement of high-energy argon neutral and ion in a 13.56 MHz capacitively-coupled plasma
    Ichikawa, Keita
    Chu, Manh Hung
    Moriyama, Makoto
    Nakahara, Naoya
    Suzuki, Haruka
    Iino, Daiki
    Fukumizu, Hiroyuki
    Kurihara, Kazuaki
    Toyoda, Hirotaka
    APPLIED PHYSICS EXPRESS, 2021, 14 (12)
  • [23] A Comparison of Ion Energy Distributions Calculated by Various Methods in Capacitively Coupled Plasma Discharges
    Kwon, Deuk-Chul
    Yoon, Nam-Sik
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2009, 55 (05) : 1849 - 1854
  • [24] Control of ion energy in a capacitively coupled reactive ion etcher
    Park, HM
    Garvin, C
    Grimard, DS
    Grizzle, JW
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (12) : 4247 - 4252
  • [25] Spatial evolution of the electron energy distribution function in a low-pressure capacitively coupled plasma containing argon and krypton
    Zhu, Xi-Ming
    Chen, Wen-Cong
    Li, Jiang
    Cheng, Zhi-Wen
    Pu, Yi-Kang
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2012, 21 (04):
  • [26] Optimization of RF Frequencies in Dual-Frequency Capacitively Coupled Plasma Apparatus Using Genetic Algorithm (GA) and Plasma Simulation
    Takagi, Shigeyuki
    Sekine, Makoto
    Nakaegawa, Tatsuhiro
    Hsiao, Shih-Nan
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2023, 36 (04) : 547 - 552
  • [27] Electron energy probability function measurement in a 2 MHz and 13.56 MHz dual-frequency capacitively coupled argon plasma
    Hong, Young-Hun
    Kim, Tae-Woo
    Kim, Beom-Seok
    Lee, Moo-Young
    Chung, Chin-Wook
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2022, 31 (07):
  • [28] On singlet metastable states, ion flux and ion energy in single and dual frequency capacitively coupled oxygen discharges
    Hannesdottir, H.
    Gudmundsson, J. T.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2017, 50 (17)
  • [29] Radial density uniformity of dual frequency capacitively coupled plasma
    Jiang Xiang-Zhan
    Liu Yong-Xin
    Bi Zhen-Hua
    Lu Wen-Qi
    Wang You-Nian
    ACTA PHYSICA SINICA, 2012, 61 (01)
  • [30] Simulation of Dual-Electrode Capacitively Coupled Plasma Discharges
    Lu Yijia
    Ji Linhong
    Cheng Jia
    PLASMA SCIENCE & TECHNOLOGY, 2016, 18 (12) : 1175 - 1180