X-ray reflectivity of chemically vapor-deposited diamond single crystals in the Laue geometry
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作者:
Stoupin, S.
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Cornell Univ, Cornell High Energy Synchrotron Source, Ithaca, NY 14850 USACornell Univ, Cornell High Energy Synchrotron Source, Ithaca, NY 14850 USA
Stoupin, S.
[1
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Ruff, J. P. C.
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Cornell Univ, Cornell High Energy Synchrotron Source, Ithaca, NY 14850 USACornell Univ, Cornell High Energy Synchrotron Source, Ithaca, NY 14850 USA
Ruff, J. P. C.
[1
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Krawczyk, T.
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Cornell Univ, Cornell High Energy Synchrotron Source, Ithaca, NY 14850 USACornell Univ, Cornell High Energy Synchrotron Source, Ithaca, NY 14850 USA
Krawczyk, T.
[1
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Finkelstein, K. D.
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Cornell Univ, Cornell High Energy Synchrotron Source, Ithaca, NY 14850 USACornell Univ, Cornell High Energy Synchrotron Source, Ithaca, NY 14850 USA
Finkelstein, K. D.
[1
]
机构:
[1] Cornell Univ, Cornell High Energy Synchrotron Source, Ithaca, NY 14850 USA
The absolute X-ray reflectivity of chemically vapor-deposited (CVD) single-crystal diamond plates was measured in the Laue geometry in the double-crystal non-dispersive setting with an asymmetric Si beam-conditioner crystal. The measurements were supplemented by rocking-curve topography. The measured reflectivity curves are examined in the framework of the Darwin-Hamilton approach using a set of two independent parameters: the characteristic thickness of mosaic blocks and their average angular misorientation. Owing to strong extinction effects, the width of the reflectivity curves does not directly represent the average misorientation of the blocks. Two different sets of parameters were found for the 111 asymmetric reflection in the two different scattering configurations (beam compression and beam expansion). Analysis of the rocking-curve topographs shows that this discrepancy can be attributed to inhomogeneity of the diamond crystal microstructure.
机构:
Pontificia Univ Catolica Chile, Fac Fis, Santiago 22, ChileUniv Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
del Campo, Valeria
Cisternas, Edgardo
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Pontificia Univ Catolica Chile, Fac Fis, Santiago 22, ChileUniv Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
Cisternas, Edgardo
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Taub, Haskell
Vergara, Ignacio
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Pontificia Univ Catolica Chile, Fac Fis, Santiago 22, ChileUniv Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
Vergara, Ignacio
Corrales, Tomas
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Pontificia Univ Catolica Chile, Fac Fis, Santiago 22, ChileUniv Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
Corrales, Tomas
Soza, Pamela
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Pontificia Univ Catolica Chile, Fac Fis, Santiago 22, ChileUniv Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
Soza, Pamela
Volkmann, Ulrich G.
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Pontificia Univ Catolica Chile, Fac Fis, Santiago 22, ChileUniv Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
Volkmann, Ulrich G.
Bai, Mengjun
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Univ Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
Univ Missouri, Univ Missouri Res Reactor, Columbia, MO 65211 USAUniv Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
Bai, Mengjun
Wang, Siao-Kwan
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Univ Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
Univ Missouri, Univ Missouri Res Reactor, Columbia, MO 65211 USAUniv Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
Wang, Siao-Kwan
Hansen, Flemming Y.
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Tech Univ Denmark, Dept Chem, DK-2800 Lyngby, DenmarkUniv Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
Hansen, Flemming Y.
Mo, Haiding
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Adv Optowave Corp, Holbrook, NY 11741 USAUniv Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
Mo, Haiding
Ehrlich, Steven N.
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机构:
Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USAUniv Missouri, Dept Phys & Astron, Columbia, MO 65211 USA