FRACTURE STRENGTH OF FREESTANDING CHEMICALLY VAPOR-DEPOSITED DIAMOND FILMS

被引：6
|
作者：
STEYER, TE
FABER, KT
DRORY, MD
机构：
[1] NORTHWESTERN UNIV,DEPT MAT SCI & ENGN,EVANSTON,IL 60208
[2] CRYSTALLUME INC,SANTA CLARA,CA 95054
来源：
APPLIED PHYSICS LETTERS | 1995年 / 66卷 / 23期
关键词：
D O I：
10.1063/1.113617
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The fracture strength of free-standing chemically vapor-deposited diamond films was assessed by four-point bending. A two-parameter Weibull analysis was performed on 130 μm thick films resulting in a Weibull modulus of 4.3 and a statistical scaling stress of 626 MPa. The residual stress in films was measured from the free-standing film curvature to be 384±10 MPa. The fracture surface chemistry was examined using scanning Auger spectroscopy. The fracture did not occur preferentially along grain boundaries.© 1995 American Institute of Physics.
引用
收藏
页码：3105 / 3107
页数：3
相关论文
共 50 条
  • [1] Fracture strength of free-standing chemically vapor-deposited diamond films
    Appl Phys Lett, 23 (3105):
  • [2] FREESTANDING SINGLE-CRYSTALLINE CHEMICALLY VAPOR-DEPOSITED DIAMOND FILMS
    TZENG, Y
    WEI, J
    WOO, JT
    LANFORD, W
    APPLIED PHYSICS LETTERS, 1993, 63 (16) : 2216 - 2218
  • [3] FRACTURE-TOUGHNESS OF CHEMICALLY VAPOR-DEPOSITED DIAMOND
    DRORY, MD
    GARDINIER, CF
    SPECK, JS
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1991, 74 (12) : 3148 - 3150
  • [4] Chemical Mechanical Polishing Slurries for Chemically Vapor-Deposited Diamond Films
    Yuan, Zewei
    Jin, Zhuji
    Zhang, Youjun
    Wen, Quan
    JOURNAL OF MANUFACTURING SCIENCE AND ENGINEERING-TRANSACTIONS OF THE ASME, 2013, 135 (04):
  • [5] SPECTRAL RESPONSE OF THE PHOTOCONDUCTIVITY OF POLYCRYSTALLINE CHEMICALLY VAPOR-DEPOSITED DIAMOND FILMS
    GONON, P
    DENEUVILLE, A
    GHEERAERT, E
    FONTAINE, F
    DIAMOND AND RELATED MATERIALS, 1994, 3 (4-6) : 836 - 839
  • [6] POLARIZED RAMAN-SPECTROSCOPY OF CHEMICALLY VAPOR-DEPOSITED DIAMOND FILMS
    PRAWER, S
    NUGENT, KW
    WEISER, PS
    APPLIED PHYSICS LETTERS, 1994, 65 (18) : 2248 - 2250
  • [7] TRIBOLOGICAL IMPROVEMENTS OF POLISHED CHEMICALLY VAPOR-DEPOSITED DIAMOND FILMS BY FLUORINATION
    MIYAKE, S
    APPLIED PHYSICS LETTERS, 1994, 65 (09) : 1109 - 1111
  • [8] PIEZORESISTIVITY IN VAPOR-DEPOSITED DIAMOND FILMS
    ASLAM, M
    TAHER, I
    MASOOD, A
    TAMOR, MA
    POTTER, TJ
    APPLIED PHYSICS LETTERS, 1992, 60 (23) : 2923 - 2925
  • [9] REACTION LAYER FORMATION AND FRACTURE AT CHEMICALLY VAPOR-DEPOSITED DIAMOND METAL INTERFACES
    PERRY, SS
    SOMORJAI, GA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04): : 1513 - 1518
  • [10] COMPARATIVE-STUDY OF TRIMETHYLBORON DOPING OF HOT-FILAMENT CHEMICALLY VAPOR-DEPOSITED AND MICROWAVE PLASMA CHEMICALLY VAPOR-DEPOSITED DIAMOND FILMS
    POLO, MC
    CIFRE, J
    PUIGDOLLERS, J
    ESTEVE, J
    THIN SOLID FILMS, 1994, 253 (1-2) : 136 - 140
12345