Radiation-induced deep levels in n-type GaAs grown by metal-organic chemical-vapor deposition

被引:0
|
作者
Naz, Nazir A. [1 ,2 ]
Qurashi, Umar S. [1 ]
Iqbal, M. Zafar [1 ]
机构
[1] Quaid I Azam Univ, Dept Phys, Semicond Phys Lab, Islamabad 45320, Pakistan
[2] Fed Urdu Univ Arts Sci & Technol, Dept Appl Phys, Islamabad 45320, Pakistan
关键词
GaAs; Deep levels; Irradiation; DLTS; MOCVD; ELECTRICAL CHARACTERIZATION; IRRADIATION; DEFECTS; TRAPS; EMISSION;
D O I
10.1016/j.physb.2009.08.204
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We report a comprehensive study of deep levels in the entire band gap of alpha-irradiated n-type GaAs, grown by metal-organic vapor phase epitaxy (MOVPE), over a wide temperature scan range of 12-475 K. Deep level transient spectroscopy (DLTS) reveals the presence of, at least, seven radiation-induced deep level defects at energy positions E-c-0.05 eV, E-c-0.14 eV, E-c-0.19 eV, E-c-0.34 eV, E-c-0.38 eV, E-c-0.59 eV and E-c-0.69 eV in the upper-half of the band gap, while two radiation-induced defects at energy positions E-v+0.54 eV and E-v+0.77 eV were observed in the lower-half band gap. Some significant differences have been observed with respect to the published work on Schottky barrier diodes. Detailed data on the emission rates, capture cross-sections and introduction rates of the radiation-induced defects are presented. The majority carrier emitting levels at E-c-0.05 eV and E-c-0.14 eV have been found to have electric-field-dependent emission rate signatures. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:4981 / 4983
页数:3
相关论文
共 50 条
  • [41] Influences of ultrathin amorphous buffer layers on GaAs/Si grown by metal-organic chemical vapor deposition
    Hu, Haiyang
    Wang, Jun
    Cheng, Zhuo
    Yang, Zeyuan
    Yin, Haiying
    Fan, Yibing
    Ma, Xing
    Huang, Yongqing
    Ren, Xiaomin
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2018, 124 (04): : 1 - 7
  • [42] Seeded self-assembled GaAs quantum dots grown in two-dimensional V grooves by selective metal-organic chemical-vapor deposition
    Ishida, S
    Arakawa, Y
    Wada, K
    APPLIED PHYSICS LETTERS, 1998, 72 (07) : 800 - 802
  • [43] Gallium doping dependence of single-crystal n-type Zno grown by metal organic chemical vapor deposition
    Ye, JD
    Gu, SL
    Zhu, SM
    Liu, SM
    Zheng, YD
    Zhang, R
    Shi, Y
    Yu, HQ
    Ye, YD
    JOURNAL OF CRYSTAL GROWTH, 2005, 283 (3-4) : 279 - 285
  • [44] Schottky characteristics of InAlAs grown by metal-organic chemical vapor deposition
    Ohshima, T
    Moriguchi, H
    Shigemasa, R
    Goto, S
    Tsunotani, M
    Kimura, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1999, 38 (2B): : 1161 - 1163
  • [45] ZnO thin film grown by metal-organic chemical vapor deposition
    Du, GT
    Wang, XQ
    Yang, SR
    Yang, XT
    Wang, JZ
    Zhang, YT
    Liu, D
    Ma, Y
    Liu, DL
    Ong, HC
    FRONTIERS OF SOLID STATE CHEMISTRY, 2002, : 383 - 389
  • [46] As-grown deep-level defects in n-GaN grown by metal-organic chemical vapor deposition on freestanding GaN
    Chen, Shang
    Honda, Unhi
    Shibata, Tatsunari
    Matsumura, Toshiya
    Tokuda, Yutaka
    Ishikawa, Kenji
    Hori, Masaru
    Ueda, Hiroyuki
    Uesugi, Tsutomu
    Kachi, Tetsu
    JOURNAL OF APPLIED PHYSICS, 2012, 112 (05)
  • [47] Growth studies and optical properties of Zn1-xCdxO films grown by metal-organic chemical-vapor deposition
    Sartel, Corinne
    Haneche, Nadia
    Vilar, Christele
    Amiri, Gaelle
    Laroche, Jean-Michel
    Jomard, Francois
    Lusson, Alain
    Galtier, Pierre
    Sallet, Vincent
    Couteau, Christophe
    Lin, Jenny
    Aad, Roy
    Lerondel, Gilles
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2011, 29 (03):
  • [48] Determination of the band-gap energy of Al1-xInxN grown by metal-organic chemical-vapor deposition
    Kim, KS
    Saxler, A
    Kung, P
    Razeghi, M
    Lim, KY
    APPLIED PHYSICS LETTERS, 1997, 71 (06) : 800 - 802
  • [49] ZnMgO nanorod arrays grown by metal-organic chemical vapor deposition
    Wang, J. R.
    Ye, Z. Z.
    Huang, J. Y.
    Ma, Q. B.
    Gu, X. Q.
    He, H. P.
    Zhu, L. P.
    Lu, J. G.
    MATERIALS LETTERS, 2008, 62 (8-9) : 1263 - 1266
  • [50] Schottky characteristics of InAlAs grown by metal-organic chemical vapor deposition
    Ohshima, Tomoyuki
    Moriguchi, Hironobu
    Shigemasa, Ryoji
    Goto, Shu
    Tsunotani, Masanori
    Kimura, Tamotsu
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (2 B): : 1161 - 1163