Correlation of proton irradiation induced threshold voltage shifts to deep level traps in AlGaN/GaN heterostructures

被引:34
|
作者
Zhang, Z. [1 ]
Cardwell, D. [1 ]
Sasikumar, A. [1 ]
Kyle, E. C. H. [2 ]
Chen, J. [3 ]
Zhang, E. X. [3 ]
Fleetwood, D. M. [3 ]
Schrimpf, R. D. [3 ]
Speck, J. S. [2 ]
Arehart, A. R. [1 ]
Ringel, S. A. [1 ]
机构
[1] Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA
[2] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[3] Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA
关键词
GAN; DEGRADATION; DEFECTS; HEMTS;
D O I
10.1063/1.4948298
中图分类号
O59 [应用物理学];
学科分类号
摘要
The impact of proton irradiation on the threshold voltage (V-T) of AlGaN/GaN heterostructures is systematically investigated to enhance the understanding of a primary component of the degradation of irradiated high electron mobility transistors. The value of V-T was found to increase monotonically as a function of 1.8 MeV proton fluence in a sub-linear manner reaching 0.63 V at a fluence of 1 x 10(14) cm(-2). Silvaco Atlas simulations of V-T shifts caused by GaN buffer traps using experimentally measured introduction rates, and energy levels closely match the experimental results. Different buffer designs lead to different V-T dependences on proton irradiation, confirming that deep, acceptor-like defects in the GaN buffer are primarily responsible for the observed V-T shifts. The proton irradiation induced V-T shifts are found to depend on the barrier thickness in a linear fashion; thus, scaling the barrier thickness could be an effective way to reduce such degradation. Published by AIP Publishing.
引用
收藏
页数:6
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