Laser-heated discharge plasma extreme ultraviolet source

被引:3
|
作者
McGeoch, Malcolm W. [1 ]
机构
[1] PLEX LLC, Fall River, MA 02723 USA
关键词
NUMERICAL SIMULATION; MAGNETIC-FIELD; PIPE OVEN; LITHIUM; VAPOR; PROBABILITIES; DIFFUSION;
D O I
10.1088/0022-3727/43/10/105201
中图分类号
O59 [应用物理学];
学科分类号
摘要
A novel extreme ultraviolet source design is considered, in which an underdense pinch plasma is locally heated by a laser and the raised temperature in the heated region causes excitation followed by 13.5 nm emission. The concept is illustrated with a lithium Z-pinch transversely irradiated by a carbon dioxide laser. Absorption, excitation, thermal conduction and flux-limited radiation are considered in a simple model that predicts up to 40% conversion efficiency (4 pi sr) from 10.6 mu m light to 13.5 nm light in the irradiated region. The effects of source size on scaled source power and efficiency are discussed. Experimental data are presented on a lithium Z-pinch plasma suitable for this source.
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页数:10
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