Deposition of YBCO thin film with buffer layer by unbalanced magnetron sputtering

被引：0
|
作者：
Latief, C [1 ]
Barmawi, M [1 ]
机构：
[1] Inst Teknol Bandung, Dept Phys, Lab Elect Mat Phys, Bandung 40132, Indonesia
来源：
THIRD INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS | 1998年 / 3175卷
关键词：
sputtering; unbalanced magnetron; YBCO; buffer layer; strontium titanate;
D O I：
10.1117/12.300667
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
YBCO thin film with Strontium Titanate buffer layer has been made by using Unbalanced Magnetron Sputtering (UMS). It has been shown experimentally that resputtering effect, usually takes place in Ballanced Magnetron Sputtering and Glow Discharge Sputtering is suppressed. It turns out that the Crirical Temperature as well as the Critical current is improved.
引用
收藏
页码：196 / 199
页数：4
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