Low-temperature positron diffusion in GaAs

被引:3
|
作者
Laine, T [1 ]
Saarinen, K [1 ]
Hautojärvi, P [1 ]
机构
[1] Aalto Univ, Phys Lab, FIN-02015 Espoo, Finland
关键词
D O I
10.1103/PhysRevB.62.8058
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Positron diffusion has been measured in undoped and Si doped (n = 2 x 10(18) cm(-3)) GaAs in the temperature range 20-290 K using the positron-beam technique. The experimental diffusion length values are strongly influenced by positron trapping at vacancies and negative ions existing in the samples. After subtraction of the trapping effects the diffusion coefficient for free positrons in the GaAs lattice is obtained. The diffusion coefficient is 14 +/- 2 cm(2) s(-1) at 20 K and 1.6 +/- 0.2 cm(2) s(-1) at 295 K. Below 80 K it follows the T-1/2 law due to scattering from acoustic phonons. From 80 to 300 K the diffusion coefficient decreases strongly with increasing temperature meaning that positron scattering from polar-optical phonons is switched on.
引用
收藏
页码:8058 / 8061
页数:4
相关论文
共 50 条
  • [41] Nonstoichiometric Low-Temperature Grown GaAs Nanowires
    Alvarez, Adrian Diaz
    Xu, Tao
    Tuetuencueoglu, Goezde
    Demonchaux, Thomas
    Nys, Jean-Philippe
    Berthe, Maxime
    Matteini, Federico
    Potts, Heidi A.
    Troadec, David
    Patriarche, Gilles
    Lampin, Jean-Francois
    Coinon, Christophe
    Fontcuberta i Morral, Anna
    Dunin-Borkowski, Rafal E.
    Ebert, Philipp
    Grandidier, Bruno
    NANO LETTERS, 2015, 15 (10) : 6440 - 6445
  • [42] LOW-TEMPERATURE ELECTRON-TRANSPORT IN GAAS
    MEYER, JR
    BARTOLI, FJ
    SOLID STATE COMMUNICATIONS, 1982, 41 (01) : 19 - 22
  • [43] LOW-TEMPERATURE ANNEALING BEHAVIOR OF GAAS IMPLANTED WITH BE
    ANDERSON, CL
    DUNLAP, HL
    APPLIED PHYSICS LETTERS, 1979, 35 (02) : 178 - 180
  • [44] LOW-TEMPERATURE ANNEALING OF BE-IMPLANTED GAAS
    KWUN, SI
    HONG, CH
    SPITZER, WG
    JOURNAL OF APPLIED PHYSICS, 1983, 54 (06) : 3125 - 3128
  • [45] INTEGRATION OF LOW-TEMPERATURE GAAS ON SI SUBSTRATES
    FRANKEL, MY
    TADAYON, B
    CARRUTHERS, TF
    APPLIED PHYSICS LETTERS, 1993, 62 (03) : 255 - 257
  • [46] PICOSECOND PHOTODETECTORS FABRICATED ON LOW-TEMPERATURE GAAS
    KLINGENSTEIN, M
    KUHL, J
    NOTZEL, R
    PLOOG, K
    ROSENZWEIG, J
    MOGLESTUE, C
    SCHNEIDER, J
    HULSMANN, A
    KOHLER, K
    INSTITUTE OF PHYSICS CONFERENCE SERIES, 1992, (126): : 449 - 454
  • [47] LOW-TEMPERATURE GE HETEROEPITAXY ON GAAS(001)
    CHAMBERS, SA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 2459 - 2463
  • [48] Doping of low-temperature GaAs and GaMnAs with carbon
    Schott, GM
    Rüster, C
    Brunner, K
    Gould, C
    Schmidt, G
    Molenkamp, LW
    Sawicki, M
    Jakiela, R
    Barcz, A
    Karczewski, G
    APPLIED PHYSICS LETTERS, 2004, 85 (20) : 4678 - 4680
  • [49] POSITRON TRAPPING BY DEFECTS IN VITREOUS SILICA AT LOW-TEMPERATURE
    UEDONO, A
    KAWANO, T
    TANIGAWA, S
    URANO, A
    KYOTO, M
    ITOH, H
    JOURNAL OF PHYSICS-CONDENSED MATTER, 1995, 7 (26) : 5139 - 5149
  • [50] A VERTICAL POSITRON BEAM FOR LOW-TEMPERATURE SURFACE STUDIES
    RICEEVANS, PC
    BRITTON, DT
    COWAN, BP
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1987, 43 (04): : 283 - 285