Thin films of ferroelectrics made by pulsed laser deposition for optoelectronic applications

被引：0

作者：

Chrisey, DB ^{[1
]}

Knauss, LA ^{[1
]}

Horwitz, JS ^{[1
]}

Auyeung, RCY ^{[1
]}

Knies, D ^{[1
]}

Grabowski, KS ^{[1
]}

Donovan, EP ^{[1
]}

McCallion, K ^{[1
]}

Johnstone, W ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC 20375

来源：

ADVANCED LASER PROCESSING OF MATERIALS - FUNDAMENTALS AND APPLICATIONS | 1996年 / 397卷

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：193 / 198

页数：6

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