Electro-Thermal Investigation of GaN Vertical Trench MOSFETs

被引:13
|
作者
Chatterjee, Bikramjit [1 ]
Ji, Dong [2 ,3 ]
Agarwal, Anchal [4 ,5 ]
Chan, Silvia H. [4 ,6 ]
Chowdhury, Srabanti [2 ]
Choi, Sukwon [1 ]
机构
[1] Penn State Univ, Dept Mech Engn, University Pk, PA 16802 USA
[2] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
[3] Intel Corp, Santa Clara, CA 95054 USA
[4] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
[5] Western Digital Corp, San Jose, CA 95138 USA
[6] SpaceX Corp, Hawthorn, CA 90250 USA
关键词
Gallium nitride; Substrates; MODFETs; HEMTs; Thermal conductivity; Temperature measurement; Performance evaluation; Electrothermal effects; gallium nitride; power MOSFET; thermoreflectance imaging; thermal management of electronics; ALGAN/GAN; IMPACT;
D O I
10.1109/LED.2021.3065362
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An electro-thermal co-design study has been performed on vertical GaN transistors (oxide, GaN interlayer based vertical trench MOSFETs; OG-FETs). Vertical (GaN-on-GaN) and quasi vertical (GaN-on-sapphire) devices were investigated. Vertical devices showed a 60% lower device peak temperature rise as compared to the quasi-vertical OG-FETs. Using electro-thermal device simulation, the internal electric field and heat generation distributions within the OG-FETs were analyzed. The temperature rise of a hexagonal honeycomb structured scaled array of OG-FETs was characterized using thermoreflectance thermal imaging and infrared thermography. A 3D thermal model was used to evaluate the impact of design variables including the number of cells, the pitch between individual cells, and the aspect ratio of the array configuration on the self-heating behavior of multi-cell arrays of OG-FETs.
引用
收藏
页码:723 / 726
页数:4
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