Primary and secondary processes in the 193 nm photodissociation of vinyl chloride

被引:97
|
作者
Blank, DA [1 ]
Sun, WZ
Suits, AG
Lee, YT
North, SW
Hall, GE
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Chem Sci, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Dept Chem, Berkeley, CA 94720 USA
[3] Brookhaven Natl Lab, Dept Chem, Upton, NY 11973 USA
来源
JOURNAL OF CHEMICAL PHYSICS | 1998年 / 108卷 / 13期
关键词
D O I
10.1063/1.475930
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have investigated the photodissociation of vinyl chloride (H2CCHCl) at 193 nm using the technique of photofragment translational spectroscopy, The experiments were performed at the Chemical Dynamics Beamline at the Advanced Light Source and used vacuum ultraviolet synchrotron radiation for product photoionization. We have observed five primary dissociation channels following an initial pi*<--pi excitation. The majority of Cl atoms originate from an excited-state dissociation. The remaining dissociation channels are consistent with competition on the ground electronic state following internal conversion from the optically prepared state, These channels include atomic and molecular hydrogen elimination, HCl elimination, and a translationally slow Cl elimination channel. We have also identified and characterized two secondary decomposition channels: (1) the elimination of Cl from chlorovinyl radicals following the primary atomic hydrogen elimination channel, and (2) hydrogen atom elimination from vinyl radicals following the primary atomic Cl elimination, By measuring the truncation in the translational energy distribution for C2H2Cl products from primary atomic hydrogen elimination we deduce a barrier for the reverse reaction of Cl+acetylene of 11+/-2kcal/mol, Since Cl is known to add rapidly to acetylene with no activation barrier, we conclude that H loss primarily forms the ClCCH2 isomer, and that the observed 11 kcal/mol barrier pertains to a concerted addition/rearrangement path to form the alpha-chlorovinyl radical. Finally, we report low-resolution photoionization spectra for the nascent vinyl radical and HCl photoproducts, in which redshifts in the ionization onsets can be related to the internal energy content. (C) 1998 American Institute of Physics. [S0021-9606(98)02313-7].
引用
收藏
页码:5414 / 5425
页数:12
相关论文
共 50 条
  • [21] THE PHOTODISSOCIATION OF PHENYLSILANE AT 193-NM
    BAGGOTT, JE
    FREY, HM
    LIGHTFOOT, PD
    WALSH, R
    CHEMICAL PHYSICS LETTERS, 1986, 125 (01) : 22 - 26
  • [22] 193-NM PHOTODISSOCIATION OF ACETYLENE
    BALKO, BA
    ZHANG, J
    LEE, YT
    JOURNAL OF CHEMICAL PHYSICS, 1991, 94 (12): : 7958 - 7966
  • [23] 193 NM PHOTODISSOCIATION DYNAMICS OF CHLOROETHYLENES
    YANG, YA
    HE, GX
    HUANG, Y
    REILLY, PTA
    GORDON, RJ
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1993, 206 : 175 - PHYS
  • [24] Photodissociation of cyclopropyl cyanide at 193 nm
    Oh, CY
    Shin, SK
    Kim, HL
    Park, CR
    CHEMICAL PHYSICS LETTERS, 2002, 363 (3-4) : 404 - 408
  • [25] 193 NM PHOTODISSOCIATION DYNAMICS OF NITROMETHANE
    MOSS, DB
    TRENTELMAN, KA
    HOUSTON, PL
    JOURNAL OF CHEMICAL PHYSICS, 1992, 96 (01): : 237 - 247
  • [26] Photodissociation of acrylic acid at 193 nm
    Kitchen, DC
    Forde, NR
    Butler, LJ
    JOURNAL OF PHYSICAL CHEMISTRY A, 1997, 101 (36): : 6603 - 6610
  • [27] The 193-nm photodissociation of NCO
    Gómez, S
    Lambert, HM
    Houston, PL
    JOURNAL OF PHYSICAL CHEMISTRY A, 2001, 105 (26): : 6342 - 6352
  • [28] Photodissociation dynamics of benzene at 193 nm
    Hsu, TC
    Shu, JN
    Chen, Y
    Lin, JJ
    Lee, YT
    Yang, XM
    JOURNAL OF THE CHINESE CHEMICAL SOCIETY, 2002, 49 (01) : 1 - 6
  • [29] Dynamics of the 193 nm photodissociation of dichlorocarbene
    Shin, Seung Keun
    Dagdigian, Paul J.
    JOURNAL OF CHEMICAL PHYSICS, 2006, 125 (13):
  • [30] THE CONCERTED PHOTODISSOCIATION OF AZOMETHANE AT 193 NM
    GEJO, T
    FELDER, P
    HUBER, JR
    CHEMICAL PHYSICS, 1995, 195 (1-3) : 423 - 433