Nonlinear model predictive control:: from chemical industry to microelectronics

被引:4
|
作者
Nagy, ZK [1 ]
Allgöwer, F [1 ]
机构
[1] Inst Syst Theory Engn, D-70550 Stuttgart, Germany
关键词
D O I
10.1109/CDC.2004.1429419
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
The paper presents a general overview of nonlinear model predictive control (NMPC), with emphasis on problems related to robust end-point property control of batch processes. The potential advantages of using NMPC in the microelectronics industry are demonstrated using an example process of thin film deposition.
引用
收藏
页码:4249 / 4254
页数:6
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