Microwave-assisted atmospheric pressure plasma polymerization of hexamethyldisiloxane

被引：5
|
作者：
Matsubayashi, Toshiki [1 ]
Hidaka, Hiroki [1 ]
Muguruma, Hitoshi [1 ]
机构：
[1] Shibaura Inst Technol, Koto Ku, Tokyo 1358548, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2016年 / 55卷 / 07期
关键词：
DIELECTRIC BARRIER DISCHARGE; FILMS; SURFACE; JET;
D O I：
10.7567/JJAP.55.076201
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Microwave-assisted atmospheric pressure plasma polymerization is presented. A system with a re-entrant microwave cavity realizes simple matching, stable plasma, and free space under the orifice of plasma steam. Hexamethyldisiloxane is employed as a monomer, while argon is used as a carrier gas. The effective area of the hydrophobic coating film used corresponds to a circle of 20mm diameter and the deposition rate considered is 5 nm/min. Matrix-assisted laser desorption/ionization time-of-flight mass spectroscopy shows that the coating film has a large molecular weight (>200 kDa), suggesting that a high-crosslinking and three-dimensional polymer matrix is formed and microwave-assisted atmospheric pressure plasma polymerization is fulfilled. (C) 2016 The Japan Society of Applied Physics
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页数：4
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