Characterization of magnetron sputter CNx thin films

被引：6
|
作者：
Zheng, WT [1 ]
Sundgren, JE
机构：
[1] Jilin Univ, Dept Mat Sci, Changchun 130023, Peoples R China
[2] Linkoping Univ, Dept Phys, S-58183 Linkoping, Sweden
来源：
CHINESE PHYSICS LETTERS | 1998年 / 15卷 / 02期
关键词：
D O I：
10.1088/0256-307X/15/2/016
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Carbon nitride thin films were deposited at different substrate temperature (ST) by using reactive magnetron sputtering in a pure N-2 discharge, and studied by laser Raman spectroscopy, x-ray photoelectron spectroscopy (XPS), and spectroscopic ellipsometer. The Raman spectra of the films show that I(D)/I(G) decreased with the increase of ST. The D bandposition shifted towards lower frequency, while the G bandposition shifted towards higher frequency as the ST increased. The XPS data exhibit that N1s binding states also depend on ST. The optical band gap of the films is found dropped from 0.22 eV to 0.10 eV with the increase of ST.
引用
收藏
页码：120 / 122
页数：3
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