Simplified analysis of some complex film stacks in x-ray reflectivity

被引：5

作者：

Marcus, MA ^{[1
]}

机构：

[1] AT&T Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA

来源：

APPLIED PHYSICS LETTERS | 1998年 / 72卷 / 06期

关键词：

D O I：

10.1063/1.120838

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

X-ray reflectivity (XRR) is commonly used to measure the thickness, density, and roughness of thin films. XRR can be used on multilayered films, however the data analysis then involves a complex fit. Such fits display many local minima for stacks of more than two layers. It is shown how the modulated diffuse scattering arising from the correlated roughness effect can sometimes be used to measure the thickness of the top film in the stack, hence reducing the size of the parameter space to be searched. Data for three-and four-layer stacks will be presented. (C) 1998 American Institute of Physics.

引用

页码：659 / 661

页数：3

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