Probe measurements in a negative ion plasma

被引:13
|
作者
Ishikawa, I [1 ]
Iizuka, S
Hatakeyama, R
Sato, N
机构
[1] Yamanashi Univ, Fac Engn, Kofu, Yamanashi 400, Japan
[2] Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 98077, Japan
关键词
electrostatic probe; negative ion plasma; positive and negative ion sheath; saturation current ratio;
D O I
10.1143/JPSJ.67.158
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A plasma with negative ions (negative ion plasma), which is generated by introducing a small amount of SF6 gas into a surface ionized plasma (e.g., Q-machine plasma), is investigated by electrostatic probe measurements. A theoretical analysis has been made by considering the presence of a negative ion sheath (NIS) in addition to the usual positive ion sheath (PIS), where the thermal velocity of negative ions is less than that of positive ions and the electron number density n(e) is much less than the positive ion n(+). The ratios of saturation current of electrons and negative ions to that of positive ions, which are experimentally obtained by probe measurements, suggest that the sheath has a property of the change from PIS to NIS at the ratio of electron to positive-ion number densities n(e)/n(+) below 10(-2).
引用
收藏
页码:158 / 162
页数:5
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