Piroxicam-β-cyclodextrin and photosensitivity reactions

被引：7
|
作者：
Varela, P [1 ]
Amorim, I [1 ]
Massa, A [1 ]
Sanches, M [1 ]
Silva, E [1 ]
机构：
[1] Hosp Gen S Antonio, Dept Dermatol, P-4050 Porto, Portugal
来源：
CONTACT DERMATITIS | 1998年 / 38卷 / 04期
关键词：
piroxicam; piroxicam-beta-cyclodextrin; tenoxicam; thimerosal; thiosalicylic acid; NSAIDs; medicaments; drug reactions; photosensitivity; cross-sensitivity;
D O I：
10.1111/j.1600-0536.1998.tb05726.x
中图分类号：
R392 [医学免疫学];
学科分类号：
100102 ;
摘要：
[No abstract available]
引用
收藏
页码：229 / 229
页数：1
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